Photo-polymerizing micro-electronic device patterns using direct-write two-photon optical lithography

Authors

Paul Hilario National Institute of Physics, University of the Philippines Diliman
Godofredo Bautista, Jr. National Institute of Physics, University of the Philippines Diliman
Ronel Roca National Institute of Physics, University of the Philippines Diliman
Maria Emma Villamin National Institute of Physics, University of the Philippines Diliman
Armando Somintac National Institute of Physics, University of the Philippines Diliman
Vincent Ricardo Daria National Institute of Physics, University of the Philippines Diliman and Physics Department, Australian National University

Abstract

We photo-polymerize micro-electronic device patterns using direct write two-photon optical lithography. Direct writing on a negative photo-resist was accomplished by a beam scanner programmed to trace a pattern of a micro-device. We have successfully photo-polymerized a micro-inductor pattern and a transistor with a gate-width of approximately 1 micrometer. The feasibility of implementing the technique in positive photoresists is also shown by designing a transistor using three patterns.

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Issue

2008: Proceedings of the 26th Samahang Pisika ng Pilipinas Physics Congress

Article ID

SPP-2008-2B-05

Section

Optics and Plasma Physics

Published

2008-10-22

How to Cite

[1]

P Hilario, G Bautista, R Roca, ME Villamin, A Somintac, and VR Daria, Photo-polymerizing micro-electronic device patterns using direct-write two-photon optical lithography, Proceedings of the Samahang Pisika ng Pilipinas 26, SPP-2008-2B-05 (2008). URL: https://proceedings.spp-online.org/article/view/SPP-2008-2B-05.