Photo-polymerizing micro-electronic device patterns using direct-write two-photon optical lithography
Abstract
We photo-polymerize micro-electronic device patterns using direct write two-photon optical lithography. Direct writing on a negative photo-resist was accomplished by a beam scanner programmed to trace a pattern of a micro-device. We have successfully photo-polymerized a micro-inductor pattern and a transistor with a gate-width of approximately 1 micrometer. The feasibility of implementing the technique in positive photoresists is also shown by designing a transistor using three patterns.
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Taking physics to the summit
22-24 October 2008, University of the Philippines Baguio, Baguio City