Photo-polymerizing micro-electronic device patterns using direct-write two-photon optical lithography

Authors

  • Paul Hilario ⋅ PH National Institute of Physics, University of the Philippines Diliman
  • Godofredo Bautista, Jr. ⋅ PH National Institute of Physics, University of the Philippines Diliman
  • Ronel Roca ⋅ PH National Institute of Physics, University of the Philippines Diliman
  • Maria Emma Villamin ⋅ PH National Institute of Physics, University of the Philippines Diliman
  • Armando Somintac ⋅ PH National Institute of Physics, University of the Philippines Diliman
  • Vincent Ricardo Daria ⋅ PH National Institute of Physics, University of the Philippines Diliman and Physics Department, Australian National University

Abstract

We photo-polymerize micro-electronic device patterns using direct write two-photon optical lithography. Direct writing on a negative photo-resist was accomplished by a beam scanner programmed to trace a pattern of a micro-device. We have successfully photo-polymerized a micro-inductor pattern and a transistor with a gate-width of approximately 1 micrometer. The feasibility of implementing the technique in positive photoresists is also shown by designing a transistor using three patterns.

SPP 2008 Proceedings Cover

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Published

2008-10-22

Issue

2008: Proceedings of the 26th Samahang Pisika ng Pilipinas Physics Congress

Section

Optics and Plasma Physics

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How to Cite

[1]
“Photo-polymerizing micro-electronic device patterns using direct-write two-photon optical lithography”, Proc. SPP, vol. 26, no. 1, pp. SPP–2008, Oct. 2008, Accessed: May 06, 2026. [Online]. Available: https://proceedings.spp-online.org/article/view/SPP-2008-2B-05