Photo-polymerizing micro-electronic device patterns using direct-write two-photon optical lithography

Authors

Paul Hilario ⋅ PH National Institute of Physics, University of the Philippines Diliman
Godofredo Bautista, Jr. ⋅ PH National Institute of Physics, University of the Philippines Diliman
Ronel Roca ⋅ PH National Institute of Physics, University of the Philippines Diliman
Maria Emma Villamin ⋅ PH National Institute of Physics, University of the Philippines Diliman
Armando Somintac ⋅ PH National Institute of Physics, University of the Philippines Diliman
Vincent Ricardo Daria ⋅ PH National Institute of Physics, University of the Philippines Diliman and Physics Department, Australian National University

Abstract

We photo-polymerize micro-electronic device patterns using direct write two-photon optical lithography. Direct writing on a negative photo-resist was accomplished by a beam scanner programmed to trace a pattern of a micro-device. We have successfully photo-polymerized a micro-inductor pattern and a transistor with a gate-width of approximately 1 micrometer. The feasibility of implementing the technique in positive photoresists is also shown by designing a transistor using three patterns.

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Issue

2008: Proceedings of the 26th Samahang Pisika ng Pilipinas Physics Congress

Article ID

SPP-2008-2B-05

Section

Optics and Plasma Physics

Published

2008-10-22

How to Cite

[1]

P Hilario, G Bautista, R Roca, ME Villamin, A Somintac, and VR Daria, Photo-polymerizing micro-electronic device patterns using direct-write two-photon optical lithography, Proceedings of the Samahang Pisika ng Pilipinas 26, SPP-2008-2B-05 (2008). URL: https://proceedings.spp-online.org/article/view/SPP-2008-2B-05.