Characterization of a surface-emitting diode using infrared-optical beam induced resistance change
Abstract
We apply the infrared-optical beam induced resistance change (IR-OBIRCH) technique to evaluate the quality of a p-i-n diode. Using an optical-feedback confocal laser diode microscope, an image is acquired while the same beam induces local resistance changes on the device. A current/resistance map of the device can then be obtained. The method was able to distinguish between functional and faulty devices in a matrix of diodes. Unlike the optical beam induced current (OBIC) method, the OBIRCH method can also map out resistance inhomogeneities in the metal and semiconductor regions.