Maskless microfabrication of semiconductor devices by non-linear photopolymerization

Authors

  • Maria Emma Villamin National Institute of Physics, University of the Philippines Diliman
  • Anthony Montecillo National Institute of Physics, University of the Philippines Diliman
  • Ryan Alentajan National Institute of Physics, University of the Philippines Diliman
  • Jamaica E. Palay National Institute of Physics, University of the Philippines Diliman
  • Vincent Ricardo Daria National Institute of Physics, University of the Philippines Diliman

Abstract

We propose a method of optical lithography that uses photo-polymerization via non-linear photon absorption of a photoresist to define two-dimensional (2D) structures on a semiconductor substrate. The nonlinear photon absorption is achieved using a focused femtosecond-pulse near-infrared laser to write a predetermined pattern on the wafer without the use of a photo-mask. The patterns are stored in a computer and via electronic control of two galvanometer-mounted scanning mirrors the focused laser beam traces the 2D structures on a photoresist-coated substrate. Hence, direct writing of patterns with a focused laser beam defines the region of the photoresist for etching, rather than being confined by the pattern on an available photo-mask. Arbitrary patterns can be fabricated and offers high potential for optimum design of semiconductor devices. Moreover, non-linear absorption can be exploited to allow for feature sizes beyond the optical diffraction limit.

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Issue

Article ID

SPP-2007-3A-05

Section

Condensed Matter Physics

Published

2007-10-24

How to Cite

[1]
ME Villamin, A Montecillo, R Alentajan, JE Palay, and VR Daria, Maskless microfabrication of semiconductor devices by non-linear photopolymerization, Proceedings of the Samahang Pisika ng Pilipinas 25, SPP-2007-3A-05 (2007). URL: https://proceedings.spp-online.org/article/view/SPP-2007-3A-05.