Curing kinetics of a semiconductor phenol-based epoxy cresol novolac mold compound via differential scanning calorimetry
Abstract
The cure kinetics of a semiconductor grade epoxy molding compound that is of epoxy cresol novolac (ECN) resin type with phenol novolac as its curing agent were investigated using differential scanning calorimeter under isothermal and dynamic modes. The reaction was analyzed using an nth order kinetic model for both exposed and unexposed samples. The order and rate constant of the cure reaction were quantitatively determined using Borchardt and Daniels, Kissinger and Ozawa, and isothermal methods and were found to be 1.6736 and 0.09628 s−1 for the exposed and 1.3381 and 0.1110 s−1 for the unexposed samples, respectively. The activation energy and the Arrhenius constant were found to be 117.77 kJ⋅mol−1 and 2.396 x 1014 for the exposed and 136.75 kJ⋅mol−1 and 4.431 x 1016 for the unexposed samples, respectively.
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