Effects of the plasma parameters on the electron temperature of low temperature DC glow discharge plasma
Abstract
The plasma produced using the glow discharge CVD facility used in low temperature diamond deposition indicated a kinetic non-equilibrium plasma state as evidenced by its two temperature state – the bulk plasma temperature, Tplasma and the electron temperature, Te. This study determined the electron temperature of the plasma using optical emission spectroscopy (OES) with variations in the plasma parameters such as plasma temperature, plasma current and gas pressure. The values of the electron temperature were plotted against these plasma parameters to determine their effect on the electron temperature of the low temperature DC glow discharge plasma. Such study of the electron temperature is important as it has been established that the electron temperature is a determinant not only of the growth rate but also on the quality of deposited diamond.
