Effect of H+ and H2+ ion beam irradiation on wettability of Narra (Pterocarpus indicus) wood chips
Abstract
Positive hydrogen ion beams, H+ and H2+ are produced and extracted from a gas discharge ion source. The extracted beam current ranges from 0.01 to 0.07 μA for discharge currents of 1.0 to 4.0 mA, discharge potential between 600 V to 1000 V.
These beams produced at 1 mA and 2 mA discharge currents are used for surface modification of 1.1 x 1.5 x 0.5 cm3 local narra (Pterocarpus indicus) wood chips positioned at 70 mm downstream from the ion source. The chips were exposed for about 30 minutes. Tests indicate hydrophobic characteristics for ion-irradiated samples compared to controlled samples. The best sample exhibiting longest absorptive inhibition was irradiated for 30 minutes using a discharge current of 1.0 mA, 720 eV energy and 0 V extraction potential. SEM micrograph of the irradiated substrates reveals surface modification of the narra wood chips.