Fabrication and characterization of GaAs-based edge-emitting lasers
Abstract
GaAs-based laser devices have a variety of optoelectronic applications. This study details the fabrication of MBE grown GaAs-based lasers, namely a GaAs edge emitting laser, and an InGaAs edgeemitting laser. A Current Voltage (I-V) and optical spectroscopy characterization setup was also developed, allowing the investigation of the optoelectronic characteristics of the lasers. These are then compared to the characteristics of an externally obtained InGaAs edge emitting laser. For the edge-emitting lasers, a comparatively high value of Jth=4.4 kA/cm2 was obtained. This high value was attributed to poor metallization and reflectivity.