Effect of wall material on H production in a Plasma Sputter-Type Ion Source

Authors

  • Yvonne Dianne M. Ponce ⋅ PH National Institute of Physics, University of the Philippines Diliman
  • Jeni Rose S. Lazarte ⋅ PH National Institute of Physics, University of the Philippines Diliman
  • Henry J. Ramos ⋅ PH National Institute of Physics, University of the Philippines Diliman

Abstract

The effect of wall material on negative hydrogen ion (H) production was investigated in a multicusp Plasma Sputter-Type Ion Source (PSTIS). Steady-state cesium-seeded hydrogen plasma was generated by a tungsten filament while H was produced through surface production using a molybdenum sputter target. Plasma parameters and H yields were determined from Langmuir probe and Faraday cup measurements, respectively. At input hydrogen pressure of 1.2 mTorr and optimum plasma discharge parameters Vd = −90 V and Id = −2.25 A, the plasma parameters ne was highest and Te was lowest as determined from Langmuir probe measurements. At these conditions, aluminum generates the highest ion current density of 0.01697 mA/cm2 , which is 64% more than the 0.01085 mA/cm2 that stainless steel produces. The yield of copper, meanwhile, falls between the two materials at 0.01164 mA/cm2. The beam is maximum at Vt = −125 V. Focusing is achieved at VL = −70 V for stainless steel, VL = −60 V for aluminum, and VL = −50 V for copper. Results demonstrate that proper selection of wall material can greatly enhance the H production of the PSTIS.

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Issue

Article ID

SPP-2004-3B-02

Section

Plasma Physics

Published

2004-10-25

How to Cite

[1]
YDM Ponce, JRS Lazarte, and HJ Ramos, Effect of wall material on H− production in a Plasma Sputter-Type Ion Source, Proceedings of the Samahang Pisika ng Pilipinas 22, SPP-2004-3B-02 (2004). URL: https://proceedings.spp-online.org/article/view/SPP-2004-3B-02.