Preparation and surface characterization of MEH-PPV thin semiconducting film as potential substrate for optical waveguide
Abstract
In this paper, we report preliminary results on the preparation and surface characterization of poly[2-methoxy-5-(2'-ethylhexyloxy-1,4] phenylenevinylene (MEH-PPV) thin semiconducting film as possible substrate material for a slab optical waveguide. The polymer was deposited onto low index of refraction (n = 1.34) magnesium fluoride (MgF2) coated on a base made of glass (SiO2). Optical and scanning electron microscopy show surface defects (pinholes) on the MgF2 film on SiO2. A relatively uniform film of MEH-PPV on MgF2/SiO2 was obtained by spin-coating the polymer solution. Defects and striations on the prepared layered structures were also observed. The layers consisting of MEH-PPV/MgF2/SiO2 and MgF2/SiO2 show similar spectra with high transmittance in the region between 300-800 nm. The absorbance spectrum of MEH-PPV shows a marked peak at low value wavelengths, which agrees with the literature.
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