Preparation and surface characterization of MEH-PPV thin semiconducting film as potential substrate for optical waveguide

Authors

  • Carlito S. Ponseca Jr. Electronics and Communications Engineering Department, Mapúa Institute of Technology
  • Ivan B. Culaba Department of Physics, Ateneo de Manila University
  • Erwin P. Enriquez Department of Chemistry, Ateneo de Manila University
  • Felicito S. Caluyo Electronics and Communications Engineering Department, De La Salle University
  • Alvin B. Culaba Mechanical Engineering Department, De La Salle University

Abstract

In this paper, we report preliminary results on the preparation and surface characterization of poly[2-methoxy-5-(2'-ethylhexyloxy-1,4] phenylenevinylene (MEH-PPV) thin semiconducting film as possible substrate material for a slab optical waveguide. The polymer was deposited onto low index of refraction (n = 1.34) magnesium fluoride (MgF2) coated on a base made of glass (SiO2). Optical and scanning electron microscopy show surface defects (pinholes) on the MgF2 film on SiO2. A relatively uniform film of MEH-PPV on MgF2/SiO2 was obtained by spin-coating the polymer solution. Defects and striations on the prepared layered structures were also observed. The layers consisting of MEH-PPV/MgF2/SiO2 and MgF2/SiO2 show similar spectra with high transmittance in the region between 300-800 nm. The absorbance spectrum of MEH-PPV shows a marked peak at low value wavelengths, which agrees with the literature.

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Published

2003-10-22

How to Cite

[1]
“Preparation and surface characterization of MEH-PPV thin semiconducting film as potential substrate for optical waveguide”, Proc. SPP, vol. 21, no. 1, p. SPP-2003-PB-07, Oct. 2003, Accessed: Mar. 26, 2026. [Online]. Available: https://proceedings.spp-online.org/article/view/SPP-2003-PB-07