Pulsed laser deposition of zinc oxide [002] crystals on glass at 50 mTorr and 100 mTorr ambient oxygen pressure

Abstract

A system for pulsed laser deposition (PLD) of polycrystalline zinc oxide (ZnO) on glass substrates was developed. The depositions were done using a pulsed Nd:YAG laser operating at 355 nm wavelength, 5 ns pulse width and with energy per pulse ranging from 100 to 300 mJ. PLD of ZnO was performed for varying substrate temperatures and background pressures. X-ray diffraction methods indicated that ZnO [002] crystals were predominantly deposited on samples obtained under 50 mTorr and 100 mTorr oxygen pressures and at high substrate temperatures. The thickness and roughness of a sample were determined to be equal to 45.8 nm and 3.5 nm, respectively.