Zr/ZrN negative ion formation from a multi-cusp ion source

Abstract

Heavy negative ion formation has been of great interest because of its applications in low energy atomic physics, thin film deposition, ion implantation and isotope separation. Using a plasma sputter type negative ion source, various researchers have shown that a stable and high intensity beam source can be achieved. An example in thin film formation using the sputter type negative ion source were the carbon nitride (CN) films deposited by H. Tsuji, et. al. They were able to produce a CN^- ion beam with a maximum current of 10-20 μA and they used it to deposit CN thin films which have properties similar to that of diamond-like carbon.
H. Ramos designed and created a similar surface production-type multi-cusp negative ion source for use in the Plasma Physics Laboratory of the National Institute of Physics, mainly for thin film formation. Research studies that are envisioned for the Plasma Sputter-type Negative Ion Source (PSTNIS) include the interaction of the ion beam with a nitrogen neutral/plasma atmosphere for metal nitriding among others. Using this source coupled with a zirconium target, the aim ofthis work is to produce Zr/ZrN negative ions for future thin film applications.