A compact plasma generator with a Ta hollow cathode

Authors

Motoi Wada Department of Electronics, Doshisha University, Japan
Toshiro Kasuya Department of Electronics, Doshisha University, Japan
Yasuyuki Okada Department of Electronics, Doshisha University, Japan
Efren D. Lumawag Department of Physics, Mindanao State University – General Santos City, Philippines

Abstract

Thin film-formation by using sputtering and the successive deposition processes has been utilized extensively in industrial applications. Plasma parameters of surface coating devices range 10¹⁰ to 10¹¹ cm^-3 electron density, and 1 to 5 eV electron temperature. In the field of thermonuclear fusion research, plasmas having much higher electron density and temperature undergo plasma-surface interactions. As the consequence of the interaction between the plasma of higher energy density and a solid surface, intense fluxes of particles that can never be produced in a low temperature and low density plasma are created. In this study, the performance of a compact plasma generator having the structure and plasma parameters close to PISCES, being used to simulate the plasma-surface-interaction of tokamak devices, is reported.

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Issue

1999: Proceedings of the 17th National Physics Congress of the Samahang Pisika ng Pilipinas

Article ID

SPP-1999-SG-11

Section

Signal Processing and Instrumentation

Published

1999-10-22

How to Cite

[1]

M Wada, T Kasuya, Y Okada, and ED Lumawag, A compact plasma generator with a Ta hollow cathode, Proceedings of the Samahang Pisika ng Pilipinas 17, SPP-1999-SG-11 (1999). URL: https://proceedings.spp-online.org/article/view/SPP-1999-SG-11.