A compact plasma generator with a Ta hollow cathode

Authors

Motoi Wada ⋅ JP Department of Electronics, Doshisha University, Japan
Toshiro Kasuya ⋅ JP Department of Electronics, Doshisha University, Japan
Yasuyuki Okada ⋅ JP Department of Electronics, Doshisha University, Japan
Efren D. Lumawag ⋅ PH Department of Physics, Mindanao State University – General Santos City, Philippines

Abstract

Thin film-formation by using sputtering and the successive deposition processes has been utilized extensively in industrial applications. Plasma parameters of surface coating devices range 10¹⁰ to 10¹¹ cm^-3 electron density, and 1 to 5 eV electron temperature. In the field of thermonuclear fusion research, plasmas having much higher electron density and temperature undergo plasma-surface interactions. As the consequence of the interaction between the plasma of higher energy density and a solid surface, intense fluxes of particles that can never be produced in a low temperature and low density plasma are created. In this study, the performance of a compact plasma generator having the structure and plasma parameters close to PISCES, being used to simulate the plasma-surface-interaction of tokamak devices, is reported.

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Issue

1999: Proceedings of the 17th National Physics Congress of the Samahang Pisika ng Pilipinas

Article ID

SPP-1999-SG-11

Section

Signal Processing and Instrumentation

Published

1999-10-22

How to Cite

[1]

M Wada, T Kasuya, Y Okada, and ED Lumawag, A compact plasma generator with a Ta hollow cathode, Proceedings of the Samahang Pisika ng Pilipinas 17, SPP-1999-SG-11 (1999). URL: https://proceedings.spp-online.org/article/view/SPP-1999-SG-11.