GPIB-controlled electrostatic energy analyzer in a plasma sputter-type negative ion source
Abstract
Ion beam applications such as ion implantation can be studied using the Plasma Sputter-type Negative Ion Source (PSNIS) developed by Ramos, et al., in the Plasma Research Laboratory. Sufficient beam current density and diameter is a requirement for ion beam applications such as surface modification or film deposition. Manipulation of the beam, during transit to the target chamber by mcans of focusing and deflection, is seen crucial to achieving optimum beam current density and beam shape at the target.
We will present the system that interfaces the control and data gathering from the electrostatic energy analyzer (ESA) using the GPIB (General Purpose Interface Bus) protocol with a computer. This automation is crucial in facilitating the experiment using the ESA and enhances the reliability of the results.
Also, in this paper, we are going to present some studies of the ion beam characterization using the retarding electrostatic energy analyzer (ESA). Then we will relate some of the data using the ESA with the Langmuir Probe measurements in the volume source. These enables us to determine the parameters, within the limited conditions that the experiments were done, in the volume source that can be manipulated to enable us to optimize the ion beam flux in the acceleration chamber.