Formation of TiN on metal substrates using a magnetized sheet plasma
Abstract
Numerous titanium nitride (TiN) films were produced on different target materials (Cu or stainless steel) using a magnetized sheet plasma. The use of a magnetized sheet plasma presents a new approach to the prodcution of TiN. The mixed-species plasma is formed from a total initial gas filling pressure of 5.33 Pa consisting of 1% N2 in Ar. The plasma current is 12.0 A and the potential between the cathode and anode is 150.0 V. A titanium disc placed near the anode is sputtered by the plasma beam. The target substrate is either immersed in the sheet plasma or placed about 4.0 cm parallel to the sheet plasma. In the case of Cu substrate, the target is cooled to 15°C while stainless steel is not. Both substrates were biased 20.0 V relative to the anode.
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