Development of ion source for the formation of high grade films

Authors

  • Henry J. Ramos National Institute of Physics, University of the Philippines Diliman
  • Mamiko Sasao National Institute for Fusion Science, Nagoya
  • Akira Taniike National Institute for Fusion Science, Nagoya
  • Motoi Wada Department of Electronics, Doshisha University, Kyoto

Abstract

The National Institute for Fusion Science, Nagoya, has developed a plasma-sputter-type negative ion source which is not only useful as a heavy ion beam probe for the Large Helical Device when coupled to a tandem accelerator, but also for ion beam applications such as ion implantation. Another application as a beam source has been considered. A one liter volume ion source to study Au- production is used in the present study by changing the gold target to a titanium target. The produced Ti- beam from the sputtering xenon ions is colimated into a reaction chamber containing nitrogen gas. The resulting interaction of the ion beam and nitrogen forming TiN on silicon substrate is investigated. The use of a plasma-sputter-type negative ion source presents a new approach for the production of high grade coatings like TiN.

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Issue

Article ID

SPP-1995-PL-02

Section

Plasma Physics and Liquid Crystals

Published

1995-10-21

How to Cite

[1]
HJ Ramos, M Sasao, A Taniike, and M Wada, Development of ion source for the formation of high grade films, Proceedings of the Samahang Pisika ng Pilipinas 13, SPP-1995-PL-02 (1995). URL: https://proceedings.spp-online.org/article/view/SPP-1995-PL-02.