Development of ion source for the formation of high grade films

Abstract

The National Institute for Fusion Science, Nagoya, has developed a plasma-sputter-type negative ion source which is not only useful as a heavy ion beam probe for the Large Helical Device when coupled to a tandem accelerator, but also for ion beam applications such as ion implantation. Another application as a beam source has been considered. A one liter volume ion source to study Au^- production is used in the present study by changing the gold target to a titanium target. The produced Ti^- beam from the sputtering xenon ions is colimated into a reaction chamber containing nitrogen gas. The resulting interaction of the ion beam and nitrogen forming TiN on silicon substrate is investigated. The use of a plasma-sputter-type negative ion source presents a new approach for the production of high grade coatings like TiN.