Production and characterization of polycrystalline films by plasma-enhanced chemical vapor deposition in NIPPER IIU

Authors

Cristine D. L. R. Villagonzalo National Institute of Physics, University of the Philippines Diliman
Henry J. Ramos National Institute of Physics, University of the Philippines Diliman

Abstract

The formation of solid deposits by initiating chemical reactions have been conducted in the National Institute of Physics Plasma Experimental Rig II Upgrade (NIPPER IIU), a d.c. glow discharge facility. The process of plasma-enhanced chemical vapor deposition (PCVD) is employed. Ethyne (C₂H₂), hydrogen (H₂) and argon (Ar) gases were used in varying ratios in the discharge. Stainless steel type 304 was used as the substrate. It was observed that the negatively biased substrate in the glow discharge containing 10%, 20% and 25% of C₂H₂ in Ar and 1% , 5%, and 10% of C₂H₂ in H₂ produces films which have characteristic textures similar to natural diamond. The production and characterization of the films are essential for carbonization applications.

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Issue

1992: Proceedings of the International Conference on Physics and Technology in the 1990's

Article ID

ICPT-1992-SM-08

Section

Condensed Matter Physics, Superconductivity and Materials Physics

Published

1992-12-01

How to Cite

[1]

CDLR Villagonzalo and HJ Ramos, Production and characterization of polycrystalline films by plasma-enhanced chemical vapor deposition in NIPPER IIU, Proceedings of the Samahang Pisika ng Pilipinas 10, ICPT-1992-SM-08 (1992). URL: https://proceedings.spp-online.org/article/view/ICPT-1992-SM-08.