Electrical and structural properties of Cu_xO film at varying annealing temperatures

Authors

Luce Vida A. Sayson Materials Science and Engineering Program, University of the Philippines Diliman
Horace Andrew F. Husay National Institute of Physics, University of the Philippines Diliman
Maria Cecilia M. Angub Materials Science and Engineering Program, University of the Philippines Diliman
Armando S. Somintac National Institute of Physics, University of the Philippines Diliman

Abstract

Copper oxide thin films were deposited on glass substrates using spray pyrolysis technique and were subsequently annealed at 160°C and 400°C for two hours. The effects of annealing on the structural and electrical properties of the films were investigated using X-ray diffraction (XRD) and Hall effect measurements. XRD pattern of the films revealed the formation of single phase cupric oxide for un-annealed sample, while intensified diffraction peaks and decreased FWHM were observed for annealed samples attributed to increased crystallinity. Hall effect measurements showed that the deposited films exhibited p-type conductivity. Increased mobility and decreased in resistivity leads to enhancement of conductivity at elevated temperatures.

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Issue

2016: Proceedings of the 34th Samahang Pisika ng Pilipinas Physics Conference

Article ID

SPP-2016-PA-10

Section

Poster Session PA

Published

2016-08-18

How to Cite

[1]

LVA Sayson, HAF Husay, MCM Angub, and AS Somintac, Electrical and structural properties of CuxO film at varying annealing temperatures, Proceedings of the Samahang Pisika ng Pilipinas 34, SPP-2016-PA-10 (2016). URL: https://proceedings.spp-online.org/article/view/SPP-2016-PA-10.