Preparation of anatase TiO2 anti-reflective coating for p-type silicon wafers using spray deposition technique

Abstract

Anti-reflective coatings (ARC) for solar cells are important in improving efficiency of photovoltaic devices. Titania coatings can be applied to modify the refractive index and reflectivity of Si wafers. Decrease in the surface reflectivity of silicon will minimize reflection losses. Titania ARC was deposited on smooth and texturized Si wafers using anatase titania powders by spray deposition technique. The effects of spray deposition parameters such as wafer to nozzle distance, spray height on the reflectivity of titania coatings were investigated. Titania-coated Si wafers showed significant decrease in the reflective property of the surface. Texturization of the Si surface further improved the anti-reflective property by minimizing the reflectivity upto 2%.