Optical emission spectroscopic studies of an O₂/Ar microwave plasma in correlation to surface wettability

Authors

Julie Anne Ting National Institute of Physics, University of the Philippines Diliman
Jeffrey De Vero National Institute of Physics, University of the Philippines Diliman
Leo Mendel Rosario National Institute of Physics, University of the Philippines Diliman
Henry Ramos National Institute of Physics, University of the Philippines Diliman
Roy Tumlos National Institute of Physics, University of the Philippines Diliman

Abstract

Changes in the composition of a low pressure O₂/Ar microwave plasma for varying plasma parameters such as microwave power, sample bias, and O₂/Ar gas flow rate ratio were determined using optical emission spectroscopy. Intensities of representative peaks for detected plasma species such as O(I) (777.89 nm), O₂(I) (845.82 nm), Ar(I) (812.39 nm), and Ar(II) (914.56 nm) were related to the wettability of treated stainless steel surfaces. Results have shown that microwave power increased the wettability of the sample due to increased power for generation of more active species. Biasing also increased the number of these active species attracted and could react with the negatively-biased sample. Finally, O₂ addition decreased the intensity of the plasma discharge, but enhanced the wettability of stainless steel at an optimum O2/Ar gas flow rate ratio of 1.67%.

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Issue

2011: Proceedings of the 29th Samahang Pisika ng Pilipinas National Physics Congress

Article ID

SPP2011-5B-2

Section

Plasma Physics and Nanotechnology

Published

2011-10-24

How to Cite

[1]

JA Ting, J De Vero, LM Rosario, H Ramos, and R Tumlos, Optical emission spectroscopic studies of an O2/Ar microwave plasma in correlation to surface wettability, Proceedings of the Samahang Pisika ng Pilipinas 29, SPP2011-5B-2 (2011). URL: https://proceedings.spp-online.org/article/view/SPP2011-5B-2.