Transport of ions in matter (TRIM) and Monte Carlo simulation of titanium sputtering in a sheet plasma facility

Authors

  • Janella Mae R. Salamania National Institute of Physics, University of the Philippines Diliman
  • Henry J. Ramos National Institute of Physics, University of the Philippines Diliman
  • Magdaleno R. Vasquez College of Engineering, University of the Philippines

Abstract

TRIM coupled with Monte Carlo (MC) simulations were done to determine the effect of varying target bias in the sputtering of titanium in argon sheet plasma. TRIM simulations were performed to determine the sputtering yield of titanium at different incident argon ion energies. A MC program in MATLAB was then created to simulate target bombardment. Results revealed that increasing the target bias caused a decrease in the root mean square roughness of the target. It also caused a change in skewness of the surface (from negative to positive) and a change in sharpness of the height distribution.

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Issue

Article ID

SPP2014-2B-04

Section

Plasma Physics

Published

2014-10-17

How to Cite

[1]
JMR Salamania, HJ Ramos, and MR Vasquez, Transport of ions in matter (TRIM) and Monte Carlo simulation of titanium sputtering in a sheet plasma facility, Proceedings of the Samahang Pisika ng Pilipinas 32, SPP2014-2B-04 (2014). URL: https://proceedings.spp-online.org/article/view/1827.