Transport of ions in matter (TRIM) and Monte Carlo simulation of titanium sputtering in a sheet plasma facility
Abstract
TRIM coupled with Monte Carlo (MC) simulations were done to determine the effect of varying target bias in the sputtering of titanium in argon sheet plasma. TRIM simulations were performed to determine the sputtering yield of titanium at different incident argon ion energies. A MC program in MATLAB was then created to simulate target bombardment. Results revealed that increasing the target bias caused a decrease in the root mean square roughness of the target. It also caused a change in skewness of the surface (from negative to positive) and a change in sharpness of the height distribution.