Plasma production by a high temperature carbon cathode for thin film formation

Authors

  • Yasumasa Hashiguchi ⋅ JP Graduate School of Engineering, Doshisha University
  • Toshirou Kasuya ⋅ JP Graduate School of Engineering, Doshisha University
  • Magdaleno R. Vasquez ⋅ PH College of Engineering, University of the Philippines Diliman
  • Motoi Wada ⋅ JP Graduate School of Engineering, Doshisha University

Abstract

High-Z impurity free plasmas were produced by high temperature carbon ribbons performing as the discharge cathodes capable of producing 20 mA discharge current in 0.6 Pa Ar environment. The distribution of plasma concentrated in the center of discharge chamber due to the influence of confinement magnetic field. In hot cathode sustained Ar plasma using carbon ribbons, carbon thin film was formed on glass substrates, and spectral analysis showed the emission of carbon atoms into the plasma. Langmuir probe measurement suggests the existence of negative ions in plasma, and the experimental system is modified to measure negative ion density by photo-detachment method.

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Article ID

SPP2014-2B-03

Section

Plasma Physics

Published

2014-10-17

How to Cite

[1]
Y Hashiguchi, T Kasuya, MR Vasquez, and M Wada, Plasma production by a high temperature carbon cathode for thin film formation, Proceedings of the Samahang Pisika ng Pilipinas 32, SPP2014-2B-03 (2014). URL: https://proceedings.spp-online.org/article/view/1826.