Externally applied magnetic field-effects on the teraHertz emission from p-type and n-type InAs wafers
Abstract
In this work, we report the enhanced terahertz emission from p-type and n-type InAs substrates under an external magnetic field applied parallel to the surface. Magnetic field effects on the THz-TDS line shape were studied for both upward and downward magnetic field orientations using a 650 mT permanent magnet. A 180⁰ phase shift was observed in both the p-type and n-type InAs samples upon reversal of the magnetic field orientation. A higher degree of magnetic field-induced enhancement was observed in n-type InAs than in p-type InAs. Furthermore, the magnetic field-enhancement in p-type InAs is higher when the magnetic field orientation is upward while the enhancement in n-type InAs is higher when the magnetic field orientation is downward. These results were attributed to carrier drifts induced by the built-in surface electric field and external magnetic field.