XPS surface analysis of as-deposited titanium nitride on silicon fabricated using a modified magnetized sheet plasma source

Authors

Janella Mae R. Salamania ⋅ PH National Institute of Physics, University of the Philippines Diliman
Matthew Bryan P. Villanueva ⋅ PH National Institute of Physics, University of the Philippines Diliman
Henry J. Ramos ⋅ PH National Institute of Physics, University of the Philippines Diliman

Abstract

The surface quality of the titanium nitride (TiN) thin film fabricated in a modified magnetized sheet plasma source was analyzed using X-ray photoelectron spectroscopy (XPS). The TiN film was deposited at 1.3 kV titanium target bias on Si (100) and was confirmed to be predominantly (111) oriented by XRD. XPS surface analysis of the as-deposited film indicated the presence of oxygen and carbon peaks aside from the titanium and nitride peaks, suggesting contamination and oxide formation on the topmost layer of the film. High resolution XPS scans of the carbon, nitrogen and oxygen peaks revealed the complex bonds existing due to the contaminants on the surface of the film.

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Issue

2015: Proceedings of the 33rd Samahang Pisika ng Pilipinas Physics Congress

Article ID

SPP-2015-3C-03

Section

Condensed Matter Physics and Materials Science

Published

2015-06-03

How to Cite

[1]

JMR Salamania, MBP Villanueva, and HJ Ramos, XPS surface analysis of as-deposited titanium nitride on silicon fabricated using a modified magnetized sheet plasma source, Proceedings of the Samahang Pisika ng Pilipinas 33, SPP-2015-3C-03 (2015). URL: https://proceedings.spp-online.org/article/view/1098.